germanium$31452$ - vertaling naar grieks
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germanium$31452$ - vertaling naar grieks

CHEMICAL COMPOUND
Silicon-Germanium-On-Insulator; Silicon germanium on insulator; Sgoi; Silicon germanium; Silicon germanide; Germanium silicide; SiGe; Silicon-germanium

germanium      
n. γερμάνιο
junction diode         
  • 225px
  • A vacuum tube containing two power diodes
  • Schematic of basic ac-to-dc power supply
  • Structure of a [[vacuum tube]] diode. The filament itself may be the cathode, or more commonly (as shown here) used to heat a separate metal tube which serves as the cathode.
  • This simple diode clamp will clamp the negative peaks of the incoming waveform to the common rail voltage
  • [[Current–voltage characteristic]] of a p–n junction diode showing three regions: '''Breakdown''', '''Reverse''' biased, '''Forward''' biased. The exponential's "knee" is at V<sub>d</sub>. The leveling off region which occurs at larger forward currents is not shown.
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  • doping]] level, leading to built-in potential of ~0.59V. Observe the different [[quasi Fermi level]]s for conduction band and valence band in n and p regions (red curves).
  • envelope demodulator]] circuit.
  • 110px
ABSTRACT ELECTRONIC COMPONENT WITH TWO TERMINALS THAT ALLOWS CURRENT TO FLOW IN ONE DIRECTION
Silicon rectifiers; Thermionic diode; Silicon diode; Crystal diode; Semiconductor diode; Shockley's diode equation; Shockley equation; Shockley's equation; Point contact diode; Germanium diode; Power diode; Point-contact diode; Junction diode; Diodes; Diode forward voltage drop; Reverse recovery time; Applications of diodes
δίοδος ζεύξης

Definitie

Ekasilicon
·noun The name of a hypothetical element predicted and afterwards discovered and named germanium;
- so called because it was a missing analogue of the silicon group. ·see Germanium, and ·cf. Ekabor.

Wikipedia

Silicon–germanium

SiGe ( or ), or silicon–germanium, is an alloy with any molar ratio of silicon and germanium, i.e. with a molecular formula of the form Si1−xGex. It is commonly used as a semiconductor material in integrated circuits (ICs) for heterojunction bipolar transistors or as a strain-inducing layer for CMOS transistors. IBM introduced the technology into mainstream manufacturing in 1989. This relatively new technology offers opportunities in mixed-signal circuit and analog circuit IC design and manufacture. SiGe is also used as a thermoelectric material for high-temperature applications (>700 K).